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On November 25, 2025, Shanghai XS Micro Technology Co., Ltd. made a significant announcement: its self-developed, first-of-its-kind 350nm stepper photolithography machine, designated as the AST6200, has successfully concluded factory debugging and acceptance procedures. The machine is now en route to its inaugural customer. Tailored specifically for applications in the power, radio frequency, optoelectronics, and Micro LED sectors, this photolithography machine boasts cutting-edge features including high-resolution imaging capabilities, exceptional overlay precision, a high-throughput design, and software that is 100% independently controllable. This achievement represents another pivotal milestone for China in the realm of high-end semiconductor photolithography equipment.
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