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On June 15th, Anhui Lingguang Infrared Technology Co., Ltd. successfully hosted the global launch event for the LUXET VERITAS low-light microscope and the dual-function microscope, which combines Laser-Induced Resistance Change technology (EMMI+OBIRCH), in Hefei. Representatives from seven leading industry laboratories, including Sentec and GigaTest, gathered to witness the technological leap of this domestically produced high-end semiconductor inspection equipment. This device seamlessly integrates two core functions—EMMI low-light detection and OBIRCH laser-induced resistance change—delivering a “two-in-one” solution that comprehensively addresses the full spectrum of semiconductor inspection requirements. This achievement represents a significant milestone in China’s independent innovation within the field of electrical failure analysis technology.
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