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NAURA Announces Breakthrough in Two-Step Etching for 3D DRAM
3 hour ago /
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Author：小编
NAURA has declared a significant breakthrough in the manufacturing process of 3D DRAM by developing a two-step cyclic etching process, achieving an ultra-high SiGe-to-Si etching selectivity ratio exceeding 500:1, laying the foundation for the mass production of 3D DRAM.
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