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ASML Pushes Forward with High-NA EUV Large-Scale Mask Technology, Targeting Mass Production by 2033 and Boosting Efficiency by 40%
9 hour ago /
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Author：小编
ASML is working hand-in-hand with its clientele to pioneer larger-scale masks tailored for the upcoming generation of High-NA EUV lithography systems. This strategic initiative is set to enhance the system's suitability for crafting expansive AI and data center chips. ASML has highlighted that current EUV technology is capable of printing chips around 800 square millimeters in size, a specification that adequately caters to the design requirements of industry leaders such as NVIDIA and Google for their cutting-edge data center hardware processors and accelerators.
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