On September 8th, ASML announced that it will collaborate with key customers to develop new solutions for producing more advanced chip manufacturing equipment, meeting the demand for large data center chips designed by companies such as NVIDIA. Currently, ASML's Extreme Ultraviolet (EUV) lithography machines can produce chips with a maximum area of approximately 800 square millimeters. Its upcoming next-generation 'High Numerical Aperture' EUV lithography machine will be capable of manufacturing finer chips, but the chip area that can be produced is limited by the size of the mask. ASML plans to demonstrate a pilot production line using larger-sized masks by 2031, with large-scale mass production expected by 2033.
