AMEC has made an announcement that it has successfully delivered the inaugural unit of its Primo Domingo vapor-phase highly selective etching equipment to a prominent domestic customer specializing in integrated circuit research, development, and manufacturing. At present, the evolution of chip architecture towards three-dimensionality stands as a pivotal factor in propelling the ongoing miniaturization of chips. Among these, highly selective etching processes constitute a fundamental step in the production of three-dimensional devices. AMEC has achieved a remarkable milestone in the realm of highly selective etching equipment, specifically designed to meet the process demands of devices such as GAA, 3D NAND, and 3D DRAM. This accomplishment bridges the gap in the localization of crucial etching processes for the manufacturing of next-generation 3D semiconductor devices in China.