Search
ASML Unveils Next-Generation Hyper-NA EUV Lithography Machine, Supporting More Advanced Processes Beyond '0.7nm'
3 day ago /
Read about 0 minute
Author：小编
Global demand for AI computing power surges, with advanced process capacities constrained by lithography machines. On June 17 (local time), ASML, the world's sole supplier of EUV lithography machines, unveiled its latest technology roadmap at the SPIE EUVL 2026 conference. The company will accelerate the mass production of 0.55NA High-NA EUV and announced its next-generation Hyper-NA plan, drawing attention to China's semiconductor catch-up path.
-
C114 Communication Network -
Communication Home
7 X 24 Track global technological trends
