On November 3, Luwei Optoelectronics announced on an interactive platform that it has successfully entered mass production of semiconductor photomasks at the 180nm process node. Meanwhile, its products at the 150nm and 130nm process nodes have cleared customer verification and are now in small-scale production.

The Luxin Semiconductor project, which the company has invested in, is dedicated to producing photomasks within the 130 - 28nm range. This strategic move positions its process node layout at a leading edge within the domestic market.

Currently, semiconductor photomasks at 90nm and above process nodes have been sequentially sampled and sent to customers. Some of these products have already obtained customer verification approval. Looking ahead, the company has outlined plans to commence trial production of 40nm semiconductor photomasks in the second half of 2025, with the project advancing steadily.