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ASML and TSMC Initiate Industry Collaboration to Drive Transition to 12-inch High NA EUV Photomasks
6 hour ago /
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Author：小编
ASML and TSMC have jointly launched an industry collaboration initiative aimed at driving the transition to 12-inch photomasks to fully unlock the potential of High NA EUV lithography technology. The two parties plan to establish a pilot production line for 12-inch photomasks by 2031 and complete preparations for a complete lithography system for advanced process node production by 2033. The initiative has garnered widespread support from the industry, with multiple companies expressing their intention to join.
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