Recently, the research team led by Li Xinghui from the Tsinghua Shenzhen International Graduate School conducted an in-depth and comprehensive review of the utilization of grating interferometers within the realm of atomic-level precision positioning technology. As advanced manufacturing across the globe progresses towards achieving sub-nanometer precision, conventional measurement techniques encounter significant constraints in terms of multi-degree-of-freedom measurement capabilities, resistance to interference, and structural compactness. These limitations render it challenging for traditional methods to fulfill the stringent requirements of atomic-level manufacturing processes. Grating interferometers, distinguished by their remarkable multi-degree-of-freedom measurement proficiency, environmental resilience, and advantages in miniaturization and integration, have emerged as a pivotal technology in precision manufacturing and nanoscale metrology. This review meticulously organizes research discoveries across various measurement dimensions, utilizing nine tables to encompass displacement, angular, and multi-degree-of-freedom measurements. It summarizes crucial performance indicators such as resolution, measurement range, and stability. Furthermore, it elucidates the primary sources of error and outlines compensation strategies essential for attaining atomic-level precision, thereby offering an authoritative and valuable reference for future research endeavors and engineering applications.