On October 14, the 26th China International Industry Expo commenced at the National Exhibition and Convention Center (Shanghai), with the Innovation and Technology Pavilion spotlighting over a hundred cutting-edge scientific and technological innovations from Shanghai. Among these innovations, the extreme ultraviolet (EUV) light source system prototype, unveiled by Landau Suiyan, made its debut at the expo. Currently, this prototype stands as the most advanced domestically produced EUV light source on public display, often referred to as the "heart" of high-end lithography machines. EUV light sources constitute one of the three essential components for manufacturing advanced process chips at 7nm and below. For a long time, they have been subject to overseas technological monopolies and export restrictions, posing a significant bottleneck for China's quest for self-sufficiency in high-end chips. According to on-site staff, the localization rate of this light source system has soared to 90%, with the vast majority of core components independently developed within China. Its technical approach is in line with that of leading international manufacturers, rendering it suitable for chip exposure testing. Although mass production is still projected to be 3 to 5 years away, this breakthrough signifies a pivotal stride in transitioning domestically produced EUV light sources from the laboratory to industrial-scale production.