At the 26th China International Industrial Expo in 2026, Landao Suiyan presented a cutting-edge, domestically developed prototype of an extreme ultraviolet (EUV) light source system, notable for its 90% localization rate. The majority of its core components have been independently designed and manufactured, employing a technical strategy that is on par with leading international manufacturers. This makes the system well-suited for chip exposure testing applications. On Landao Suiyan’s official website, several EUV products are already showcased, with the high-power series having undergone successful theoretical validation and the low-power series now advancing into the productization stage, accompanied by the release of various technical specifications.

Established in 2024, Landao Technology specializes in LPP-EUV lithography light source technology and has successfully completed multiple rounds of financing. The company operates across three core business areas: EUV light source systems, high-power CO2 axial fast-flow lasers, and plasma simulation software. This exhibition represents a significant milestone in the journey of domestic EUV light sources, transitioning from laboratory research to industrial application. Nevertheless, full-scale production is anticipated to take an additional 3-5 years, as current hurdles include boosting output power and ensuring long-term operational reliability. The prototype has thus far only confirmed technical feasibility and still lacks the level of product maturity necessary for widespread industrial use.