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Full Wafer - Level Fabrication of Nanopores Realized Using ASML's EUV Lithography System
3 week ago /
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Author：小编
As reported by Tom's Hardware, the Belgian research institution imec (Interuniversity Microelectronics Centre) has successfully accomplished full - wafer - level fabrication of nanopores, leveraging ASML's cutting - edge Extreme Ultraviolet (EUV) lithography technology. Nanopores possess immense research significance within the biomedical realm. An ASML spokesperson emphasized that this achievement stands as a remarkable example of how their equipment can be effectively applied in the field of biomedicine. Considering the vast potential that nanopores hold for molecular sensing technologies, this breakthrough could potentially mark a significant milestone in the industry.
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