The 9th International Workshop on Advanced Patterning Solutions (IWAPS 2025) is set to take place in Shenzhen from October 14 to 15. As a globally significant event in the realm of photolithography technology, this symposium is organized by the China Integrated Circuit Innovation Alliance and the Chinese Optical Society. It also receives co - organization from several entities, such as the Institute of Microelectronics of the Chinese Academy of Sciences and the Shenzhen Semiconductor and Integrated Circuit Industry Alliance. The symposium is designed to create a technical communication platform that spans the entire industry chain. This encompasses various aspects including photolithography equipment, process technology, metrology and inspection, mask materials, computational lithography, and beyond.

During the course of the event, Advantest will put on display its core equipment. It will offer professional solutions for accurate photomask metrology and defect inspection, thereby lending support to the innovation and industrial upgrading efforts in the field of photolithography technology.