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Beijing Northern Microelectronics Equipment Co., Ltd. Unveils Patent for 'Innovative Trench Formation, By-product Removal, and Wafer Carrier Technique'
2025-01-15
On August 26, 2024, Beijing Northern Microelectronics Equipment Co., Ltd. announced the publication of a patent under the title 'Method for Forming Trench Structure, Removing By-products in Trench, and Wafer Carrier Device,' with the publication number CN119132945A. This groundbreaking patent employs a uniquely engineered wafer carrier device to maintain the wafer at an inclined angle within the process chamber. This technique effectively eliminates by-products from trench sidewalls, minimizes trench sidewall roughness, and significantly enhances the precision of semiconductor manufacturing processes.
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