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Qingyi Photomask has reached a significant milestone with its 55nm PSM (Phase-Shifting Mask), as it has now entered the customer onboarding certification stage. This achievement follows the signing of a non-disclosure agreement with the customer, confirmation of the product specification sheet, and the receipt—as well as fulfillment—of a purchase order. The 55nm PSM is specifically designed for critical lithography layers in semiconductor chip manufacturing, where precision in pattern accuracy is paramount. It caters to a wide range of applications, including logic circuits, memory devices, certain specialty processes, and power components. Successful certification and subsequent mass production of this product are poised to bolster Qingyi Photomask's portfolio of high-end semiconductor masks, thereby enhancing its overall profitability.
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