As reported by ZDNET Korea, Samsung Electronics is set to commercialize High NA EUV (Extreme Ultraviolet) equipment for its 1nm-class process technology. Park Chang-min, who leads the foundry process development team at Samsung Electronics, explained that while High NA EUV lithography patterning technology is not yet fully developed for the 2nm SF2 and 1.4nm SF1.4 nodes, the need for enhanced patterning resolution in the 1nm-class process will become essential. To address this, Samsung Foundry is collaborating with partners to develop the necessary technologies.

Given that Samsung has previously outlined its goal to achieve mass production of the SF1.4 process by 2029 and plans to introduce an enhanced version, SF1.4+, by 2030, it is anticipated that its 1nm node technology will not be introduced before 2030.