On July 15, Dutch semiconductor equipment manufacturer ASML announced that Intel has decided to adopt its next-generation High Numerical Aperture Extreme Ultraviolet (High NA EUV) lithography machine for the production of some flagship Panther Lake notebook computer chips. The lithography machine costs approximately $400 million, twice that of a standard EUV lithography machine, and presents significant technical challenges. Intel began trials in 2024 and is currently testing specific layers of the chips to accumulate application experience and optimize the equipment.
