On Tuesday, July 15 (local time), leading lithography equipment maker ASML (ASML.O) announced that Intel (INTC.O) has chosen to utilize its cutting-edge technology for the production of certain high-performance Panther Lake laptop chips. This strategic decision is set to enable Intel to more effectively gather hands-on experience with the advanced machinery.
According to reports, Intel has been conducting trial runs since 2024 and has successfully activated ASML’s next-generation high-numerical-aperture extreme ultraviolet (EUV) lithography system. This sophisticated equipment is designed to accurately transfer intricate circuit patterns onto silicon wafers, facilitating the manufacturing of select Panther Lake processors.
The high-numerical-aperture lithography system comes with a hefty price tag of around $400 million, doubling the cost of standard EUV lithography machines. Its integration into the production process also presents considerable technical hurdles. At present, Intel is deploying this system solely for specific process layers in chip fabrication. This approach allows both Intel and ASML to collaboratively gather data and enhance the equipment’s performance.