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Pre-treatment Coating Tech Paves the Way for Easier Manufacturing of Next-Gen Transistors
1 day ago /
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Author：小编
Through computer simulations, scientists at the Princeton Plasma Physics Laboratory, under the U.S. Department of Energy, have unveiled a breakthrough: pre-treating molybdenum disulfide with oxygen or fluorine can significantly lower the energy needed to remove its topmost layer of sulfur atoms. This advancement simplifies the manufacturing process of next-generation chip transistors, offering enhanced control and minimizing the risk of damaging the underlying structure. The pertinent research findings have been published in the esteemed Journal of Physical Chemistry Letters.
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