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The Main Construction of Hefei Jingmei Semiconductor's High-End Photomask Project is Completed
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Author：小编
According to the official news from Hefei High-Tech Zone, on June 9, the main structure of Anhui Jingmei Semiconductor's high-end photomask project was successfully capped, three weeks ahead of the original schedule. The project has a total investment of 12 billion yuan, with a phase I investment of 6.5 billion yuan, focusing on the research and development, production, and sales of high-end photomasks of 28nm and above. Upon reaching full capacity, the monthly production capacity will be approximately 3,200 wafers, with production expected to commence in 2027. After the project is completed, it will fill a critical gap in the regional integrated circuit industry chain and support the steady development of the industry.
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