On June 7, it was reported that on June 5, Pulin Technology unveiled its partnership with Shenzhen Lice, announcing the successful adoption of a vacuum pneumatic nanoimprint solution for the large-scale mass production of 8-inch optical chips. This innovative approach leverages Pulin Technology's proprietary PL-AS vacuum pneumatic wafer-level nanoimprint lithography equipment, paired with a customized dual-layer imprint resist material system and core processes. By completely sidestepping the deep ultraviolet (DUV) lithography pathway, this method significantly slashes chip manufacturing costs, bringing them down to a mere one-tenth of those associated with traditional DUV solutions. In the A-share market, stocks related to nanoimprint technology encompass Su Dawei (Suzhou Victor Bright Optoelectronics), Medikai (Medight), Lihe Xing (Lihoxing), Jingfang Technology (Wafeer Technology), Jinghua Laser (Jinghua Laser), Crystal Optronics (Crystal-Optech), and others.