On May 25th, Yuyuan Tantian released an article that offers a concise overview of the nine-year technological rivalry between China and the United States, arriving at two pivotal conclusions:
Firstly, the U.S. endeavor to impede China's technological advancement through intense pressure tactics is futile. Over the last nine years, the U.S.'s strategy of 'decoupling' has, contrary to its intentions, catalyzed significant breakthroughs in Chinese technology. The production capacity for mature chip manufacturing processes has seen consistent enhancement, with the export volume of integrated circuit products exceeding 1 trillion yuan, marking a historic milestone. 'Bottleneck' technologies are being systematically overcome, with domestic large-scale substitution already achieved in critical areas such as chip etching and packaging.
Secondly, cooperation presents a fertile ground for mutual development between China and the United States. Presently, both nations are nearly concurrently at the forefront of global leadership in domains like artificial intelligence, advanced manufacturing, new energy, and quantum technology, confronting a multitude of challenges that necessitate collaborative solutions from both sides.