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Intel Successfully Deploys World's Pioneering Commercial High-NA EUV Lithography System, Paving the Way for 1.4nm Chip Bulk Manufacturing
2025-12-19 /
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Author：小编
Intel has revealed that it has completed the installation of ASML's cutting-edge Twinscan EXE:5200B lithography system. This marks the debut of the industry's first commercial chip - fabrication High-NA EUV (Extreme Ultraviolet) lithography machine, which features a projection optical system with a numerical aperture of 0.55. The system has successfully cleared the acceptance tests and is set to be employed in the development of Intel's 14A (1.4nm) technology node. The 14A process will stand as the first in the world to integrate High-NA EUV lithography machines for critical layers, signifying the shift of High-NA EUV lithography technology from the experimental realm to the era of large-scale production.
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