The CEO of ASML, Christophe Fouquet, announced that the lithography enhancement solution, which has been specifically developed by the company for the High-NA EUV (High Numerical Aperture Extreme Ultraviolet Lithography Machine), has successfully undergone verification. This solution has showcased outstanding imaging capabilities and exceptional resolution. At present, ASML is actively collaborating with its customers to further refine and elevate the maturity level of this advanced lithography system. According to relevant reports, ASML is set to forge a close partnership with its customers over the next year. This collaboration aims to guarantee the stable and reliable operation of the High-NA EUV, thereby significantly reducing any potential downtime. Fouquet expressed his optimism, projecting that the equipment will enter the stage of mass production somewhere between 2027 and 2028.