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On October 24th, a report surfaced highlighting that lithography technology stands as a cornerstone in propelling the miniaturization trend within integrated circuit chip manufacturing processes. Recently, a research team helmed by Professor Peng Hailin from the College of Chemistry and Molecular Engineering at Peking University, in collaboration with their peers, employed cryo-electron tomography to, for the very first time, directly observe in its native environment the microscopic three-dimensional architecture, interfacial arrangement, and intertwining patterns of photoresist molecules in a liquid state. Leveraging these insights, they have crafted an industrial-scale approach that markedly diminishes lithography-related defects. The pertinent research outcomes have been duly published in Nature Communications.
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