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ASML Aims to Supply 56 Low-NA and 10 High-NA EUV Machines by 2027
2 day ago /
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Author：小编
ASML has set an ambitious goal of delivering 56 Low-NA Extreme Ultraviolet (EUV) lithography systems and 10 High-NA EUV lithography systems by the year 2027. This production volume significantly surpasses earlier projections. In the semiconductor industry, the procurement process for EUV lithography machines is a lengthy one, often stretching up to a full year. As a result, companies are typically required to make firm purchasing commitments several years ahead of time to secure these highly sought-after pieces of equipment. This practice aligns with the global semiconductor supply chain's need for long-term planning and stability, reflecting the intricate and forward-looking nature of the industry.
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