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Recently, China unveiled its first domestically developed commercial electron beam lithography machine, dubbed "Xizhi," in Hangzhou. This machine's technical specifications have aligned with international benchmarks, marking a significant advancement in China's quantum chip manufacturing sector. Employing high-energy electron beams, the "Xizhi" is capable of directly etching circuits onto silicon-based materials with an unprecedented precision of 0.6 nanometers and a line width of 8 nanometers. Its maskless operation and flexible design make it ideal for numerous debugging iterations during the chip development phase. The launch of this machine bridges the gap in domestic high-end lithography equipment and promises to bolster the development of advanced chip prototypes and mask manufacturing.
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