Pulin Technology's PRINANO division proudly announced the successful delivery of its groundbreaking PL-SR system on August 1. This marks the introduction of China's first semiconductor-grade step-and-repeat nanoimprint lithography (NIL) machine, tailored for a domestic client with specialized manufacturing processes. The PL-SR system has triumphantly addressed numerous technical hurdles in inkjet coating technology, achieving a nanometer-precision imprint film thickness. With an average residual layer of less than 10nm, a residual layer variation of less than 2nm, and an impressive aspect ratio of the imprinted structure exceeding 7:1, this system supports NIL processes capable of producing linewidths narrower than 10nm.

The PL-SR series has already completed initial R&D verification for a range of applications, including memory chips, silicon-based micro-displays, silicon photonics, and advanced packaging chips. It boasts the capability to achieve seamless stitching of 20mm×20mm imprint templates, with the potential to ultimately scale up to 12-inch wafer-level ultra-large templates. This significant advancement underscores Pulin Technology's commitment to driving innovation and excellence in the domestic semiconductor industry.