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The foremost manufacturer of lithography equipment has officially announced the shipment of its groundbreaking second-generation High NA EUV lithography machine, the EXE:5200, to Intel, commanding a unit price nearing 3 billion yuan. This state-of-the-art equipment boasts enhanced wafer processing capabilities, poised to cater to the high-volume production demands of 2-nanometer and smaller process nodes. Its advanced 0.55 numerical aperture optical system promises a remarkable uplift in resolution and precision, poised to propel the advancement of multiple cutting-edge process technologies and gradually extend its application to memory manufacturing. Nevertheless, amidst various constraints, the current supply of this equipment remains inaccessible to Chinese manufacturers.
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