Search
China's Science Achieves Notable Advancement in AI-Driven Atomic-Scale Process Simulation for Integrated Circuits
3 day ago /
Read about 0 minute
Author：小编
Researcher Chen Rui from the EDA Center at the Institute of Microelectronics of the Chinese Academy of Sciences, in collaboration with Senior Engineer Li Junjie from the Pilot Center, have made a pioneering effort by applying the molecular dynamics deduction method of machine learning potential functions (MLP) to the realm of integrated circuit etching process simulation. Their work delves deeply into the atomic-scale etching mechanisms and leverages machine learning potential functions to achieve extensive deductions of macroscopic etching profiles.
-
C114 Communication Network -
Communication Home
7 X 24 Track global technological trends
