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Intel Director Foresees Etching Technology Surpassing Lithography in Chip Manufacturing
3 week ago /
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Author：小编
The director at Intel has put forth an intriguing proposition: future transistor designs, including GAAFET and CFET, could significantly lessen the reliance on advanced lithography equipment, particularly Extreme Ultraviolet (EUV) lithography machines. This perspective challenges the established norm in advanced chip manufacturing. Presently, ASML's EUV lithography machines are indispensable for fabricating high-end chips at the 7nm node and smaller, tasked with etching intricate circuit patterns onto silicon wafers.
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