During the European Technology Symposium held in Amsterdam, TSMC emphasized that its cutting-edge 1.4-nanometer process technology does not necessitate the use of a High-NA EUV lithography machine. Currently, the company has yet to discover a compelling reason to mandate the adoption of such advanced equipment. TSMC affirmed that its next-generation process technologies, encompassing both the 1.6-nanometer A16 and the 1.4-nanometer A14, can be successfully implemented without relying on the most sophisticated lithography system. Consequently, TSMC has opted not to incorporate High-NA EUV equipment for these specific process nodes.
