Search
Shanghai Precision Measurement Semiconductor Technology Co., Ltd. Secures Patent Authorization for "Optical Characteristics Modeling Method and Device, Optical Parameter Measurement Method"
2025-05-11 /
Read about 0 minute
Author：小编
Shanghai Precision Measurement Semiconductor Technology Co., Ltd. has recently been granted a patent, titled "Optical Characteristics Modeling Method and Device, Optical Parameter Measurement Method," with authorization announcement number CN114963996B. The patent was announced on February 14, 2025, after being filed on April 22, 2022. This patent innovation encompasses the acquisition of periodic medium characteristic parameters, the formulation of a coupled wave equation system, and the streamlining of solutions to enhance optical modeling efficiency and measurement precision.
-
C114 Communication Network -
Communication Home
7 X 24 Track global technological trends
