Search
SMICFT Unveils Patent for Advanced X-ray Measurement System Tailored for Semiconductor Critical Dimension Measurement
2025-05-11 /
Read about 0 minute
Author：小编
Shenzhen SMICFT Technology Co., Ltd. has recently announced the acquisition of a patent titled "An X-ray Measurement System Applied to Critical Dimension Measurement of Semiconductors," bearing the application publication number CN119594908A, published on March 11, 2025. This patent represents a fusion of CD-SAXS and XRR measurement technologies, aimed at enhancing the precision of dimensional measurements for semiconductor samples. This achievement signifies another milestone for SMICFT in the realm of semiconductor measurement technology.
-
C114 Communication Network -
Communication Home
7 X 24 Track global technological trends
