On August 11, Park Chang Min, a member of the Foundry Process Development Team at Samsung Electronics' Semiconductor R&D Institute, announced that Samsung Foundry intends to commercialize High NA EUV (High Numerical Aperture Extreme Ultraviolet Lithography) equipment for use at the 1nm-class process node. At present, this cutting-edge technology is still in its nascent stages of introduction and is widely regarded as crucial for achieving process scaling below 2nm, as well as for advancing to even more sophisticated process nodes. For the 2nm SF2 and 1.4nm SF1.4 nodes, the High NA EUV lithography patterning technology has not yet reached full maturity. The 1nm-class node, in particular, will demand an even higher level of patterning resolution. To this end, Samsung is actively collaborating with its partners to further develop and refine this technology. Taking into account Samsung's previous announcement that it has set 2029 as the target year for mass production of the SF1.4 node, along with its plans to introduce an enhanced SF1.4+ version in 2030, it is anticipated that the 1nm node will not be introduced any earlier than 2030.