According to ZDNET Korea, SK Hynix is actively advancing Extreme Ultraviolet Lithography (EUV) technology with the aim of achieving mass production of next-generation DRAM. The company introduced High Numerical Aperture (High-NA) EUV equipment for the first time last year and has fully commenced related technology research and development this year. To enhance EUV lithography performance, SK Hynix has started to comprehensively introduce new materials such as Phase Shift Mask (PSM).