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Zeiss CEO: Without EUV Lithography Machines, the Myth of China's Rising Commercial Chip Industry is Unsustainable
3 day ago /
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Author：小编
Frank Roelofs, CEO of the German optical giant Zeiss, stated that due to U.S. export controls on China, China is unable to acquire cutting-edge extreme ultraviolet (EUV) lithography machines from the Dutch company ASML, posing a significant obstacle to the commercialization of China's semiconductor industry. He noted that in the long run, alternative solutions relying on deep ultraviolet (DUV) lithography machines combined with multiple exposures are not feasible in terms of yield and cost. However, China's localization rate for semiconductor equipment has surpassed 35%, achieving near-complete coverage in mature processes of 28nm and above, with the localization rate exceeding 80% in some key segments.
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