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Suzhou Extreme Ultraviolet Semiconductor Co., Ltd. Rolls Out Pioneering Prototype of Triple-Plasma-Coupled DPP-EUV Light Source, Shattering Domestic Barriers in Lithography Light Sources through a Dis
1 day ago /
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Author：小编
Recently, Suzhou Extreme Ultraviolet Semiconductor has made public its independently engineered prototype of a triple-plasma-coupled DPP extreme ultraviolet (13.5nm EUV) light source. By integrating innovative designs, such as electrodes configured with a gradient structure, the company has significantly boosted both the power output and stability of the light source. This breakthrough presents a promising avenue for the industrial utilization of EUV lithography.
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