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Imec announces: Successful creation of the world's first quantum dot qubit device based on High-NA EUV
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Author：小编
Belgium's semiconductor R&D giant, the Interuniversity Microelectronics Centre (imec), announced this week that it has successfully developed the world's first quantum dot qubit device fabricated using high numerical aperture extreme ultraviolet lithography technology. This marks the industry's first use of cutting-edge semiconductor mass production processes to develop advanced quantum hardware. The achievement was officially announced on May 19 at the Global Technology Forum held in Leuven. The device employs a silicon quantum dot spin qubit structure, utilizing nanoscale structures to trap single electrons and store information through the electron's quantum spin state, with a gate gap of just 6 nanometers.
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