Xingcai Semiconductor Technology (Shaoxing) Co., Ltd. has launched its R&D and industrialization project for photomask substrates in the Hangzhou-Shaoxing Airport Demonstration Zone, located in Keqiao District, Shaoxing. The project, boasting a total investment of 2 billion yuan, spans across an expansive 40-acre site. It is projected to yield an annual output of 60,000 blank photomask substrates. The overarching goal is to commence the first-phase production within a mere 10 months, thereby advancing the localization of photomask substrate manufacturing.
