The team of Zhang Jiaxiang and Ou Xin from the Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, in collaboration with the team of Professor Liu Jin from Sun Yat-sen University and the team of Professor Huo Yongheng from the University of Science and Technology of China, has achieved on-chip quantum interference interconnection between spatially separated quantum dot single-photon sources on a hybrid integrated photonic quantum chip for the first time. This achievement, through proposing a new mechanism for stress regulation on lithium niobate thin films and developing a 'micro-transfer printing' hybrid integration technology with hundred-nanometer precision, has successfully constructed the largest-scale hybrid integrated photonic quantum chip based on deterministic quantum dot light sources to date, laying an important foundation for constructing scalable on-chip quantum networks. The relevant research results have been published in Nature Materials.