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Patent for Shanghai Micro Electronics' "A Beam Adjustment Device and Lithography Machine" Published
3 day ago /
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Author：小编
According to information from Tianyancha, the patent application for "A Beam Adjustment Device and Lithography Machine" filed by Shanghai Micro Electronics Equipment (Group) Co., Ltd. has been published. The publication number is CN119668039A, and the publication date is March 21, 2025.
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