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Polin Technology: Cost of Photonic Chip Lithography Reduced to One-Tenth of Traditional DUV Solution
2026-06-05 /
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Author：小编
Recently, Polin Technology collaborated with Lace Technology to successfully achieve large-scale mass production of 8-inch photonic chip wafers using vacuum pneumatic nanoimprint technology. This technology bypasses the DUV lithography route, reducing chip manufacturing costs to one-tenth of traditional DUV solutions. The PL-AS equipment supports a linewidth resolution of
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