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Leading the charge in semiconductor equipment innovation, global giant ASML has embarked on the research and development of the next-generation Hyper NA EUV lithography machine. This ambitious project aims to fortify the foundations of the chip industry for the forthcoming decade. Collaborating closely with optical powerhouse Carl Zeiss, ASML is developing an EUV lithography system capable of achieving a single-exposure resolution of 5nm. This groundbreaking advancement is poised to cater to the processing demands anticipated by 2035 and beyond.
Currently, ASML's state-of-the-art lithography machine offers a single-exposure resolution of 8nm. However, the new Hyper NA EUV lithography machines promise to elevate efficiency and yield to unprecedented levels, marking a significant leap forward in semiconductor manufacturing technology.
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