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Chinese Academy of Sciences' Institute of Microelectronics Achieves Milestone in AI-Driven Atomic-Level Process Simulation
3 week ago /
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Author：小编
Harnessing cutting-edge AI technology to simulate etching dynamics with atomic-level precision, grasp the evolution of microstructures, and subsequently predict and optimize macroscopic process parameters is pivotal for AI-enhanced IC manufacturing. Researchers at the Institute of Microelectronics of the Chinese Academy of Sciences have pioneered the integration of the machine learning potential function molecular dynamics inference method into IC etching process simulation. This groundbreaking approach delves into the etching mechanism at the atomic scale, facilitates large-scale inference, and validates the accuracy of simulation results, marking a substantial leap in computational efficiency.
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