Hefei Xinyihua's Patent for 'Linear Evaporation Device Enhancing Film Thickness Uniformity' Published - Chip

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Hefei Xinyihua's Patent for 'Linear Evaporation Device Enhancing Film Thickness Uniformity' Published

2025-06-04 / Read about 0 minute

Author：小编

On March 14, 2025, Hefei Xinyihua Intelligent Machinery Co., Ltd. successfully published patent CN119615066A titled 'Linear Evaporation Device Enhancing Film Thickness Uniformity.' This innovative patent focuses on improving the uniformity of large-scale film thickness, ultimately enhancing product quality through meticulous device design.

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