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Nano Letters Publishes Tongji University's Research on Enhancing EUV Lithography Thin Film Mirrors' Resistance to Irradiation Damage
2025-04-30 /
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Author：小编
Recently, a groundbreaking study titled "Enhanced Damage Resistance of Mo/Si Multilayer Mirrors with Carbon Barrier Layers Under Intense Nanosecond EUV Irradiation" was published in the esteemed journal Nano Letters. This research was spearheaded by a team from Tongji University's School of Physical Science and Engineering, led by Professors Wang Zhanshan and Li Wenbin. The paper underscores a pivotal finding: the incorporation of carbon barrier layers within Mo/Si multilayer films utilized in extreme ultraviolet (EUV) lithography dramatically bolsters their resilience against damage from intense EUV irradiation. This revelation holds immense promise for advancing the efficiency and reliability of EUV lithography technology.
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