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Lam Research's Dry Resist Technology Receives imec Certification for Supporting 2nm and Advanced Process Nodes
2025-01-26 /
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Author：小编
Lam Research has announced that its innovative dry resist technology has secured certification from imec, paving the way for direct patterning at a 28nm pitch in the back-end-of-line processes of logic semiconductors. This groundbreaking technology not only meets the stringent demands of advanced processes at 2nm and beyond but also excels in optimizing photon capture and thickness control. By addressing exposure dose and defect rate challenges in EUV lithography, this environmentally friendly solution stands out. Currently, the technology has demonstrated successful validation on 0.33 NA EUV lithography tools, with promising prospects for future expansion to 0.55 NA EUV lithography platforms.
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