Lam Research Achieves High-Resolution 28nm Pitch Patterning with Groundbreaking Dry Photoresist Technology - Chip

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Lam Research Achieves High-Resolution 28nm Pitch Patterning with Groundbreaking Dry Photoresist Technology

2025-01-14

Lam Research Corporation has proudly announced that its pioneering dry photoresist technology has received certification from imec, a prominent research and innovation hub in nanoelectronics and digital technologies. This groundbreaking advancement enables direct printing of backend of line (BEOL) logic patterns at 28nm pitch, paving the way for future technologies at 2nm and beyond.

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